Energy levels of semiconductor surface vacancies
نویسندگان
چکیده
We present calculations of the bound state energy levels of anion vacancies near the surface of a III-V semiconductor. We consider the (110) surface of GaAs, InP, and the Ga1_xAlxAs alloy system. As the vacancy is moved toward the surface, the energy levels are only slightly perturbed until the vacancy reaches the second atomic layer from the surface. At this point, the anion vacancy levels move to lower energy. We find that there is a general trend in the vacancy energy levels with semiconductor ionicity. As the material becomes more ionic, the anion vacancy levels move to higher energy. Comparing this trend with experimentally observed Schottky barrier heights, we find a strong correlation between the position of the highest occupied level in the anion vacancy and the measured Fermi level at the surface. This result suggests that the recently proposed defect model is capable of accounting for observed trends in Schottky barrier formation.
منابع مشابه
Surface vacancies in II-VI and 111-V zinc blende semiconductors•>
We present calculations of the bound state energy levels of ideal vacancies near the ( 110) surface of some zinc blende II-VI and Ill-Y semiconductors: CdTe, ZnTe, GaAs, AlAs, InAs, and some alloys among them. Here we compare vacancies near the surface ofii-VI's with those ofiii-V's. In contrast to the III-V's, where a neutral vacancy has an odd number of electrons, a neutral vacancy in a II-VI...
متن کاملLOW-ENERGY-ION ENHANCED DIFFUSION AT THE SURFACE OF METALS
Radiation enhanced diffusion at the surface of metals has been observed and studied for low-energy nitrogen ions at the surface of copper. The displacement of the target atoms during irradiation creates vacancies and other defects near the surface, thus enhancing the diffusion of implanted materials toward the surface and also into the solid. The mechanism has been studied here by a specia...
متن کاملNative point defects in yttria as a high-dielectric-constant gate oxide material: a first-principles study
-Yttria (Y2O3) has become a promising gate oxide material to replace silicon dioxide in metal-oxide-semiconductor (MOS) devices. The characterization of native point defect in Y2O3 is essential to understand the behavior of the material. We used the firstprinciples pseudopotential method to study the electronic structure, defect structure and formation energy of native point defects in Y2O3. Va...
متن کاملFirst principles investigation of defect energy levels at semiconductor- oxide interfaces: Oxygen vacancies and hydrogen interstitials in the Si–SiO2–HfO2 stack
We introduce a scheme for the calculation of band offsets and defect energy levels at semiconductor-oxide interfaces. Our scheme is based on the use of realistic atomistic models of the interface structure and of hybrid functionals for the evaluation of the electronic structure. This scheme is herein applied to the technologically relevant Si–SiO2–HfO2 stack. Calculated band offsets show a very...
متن کاملSolutions of diffusion equation for point defects
An analytical solution of the equation describing diffusion of intrinsic point defects in semiconductor crystals has been obtained for a one-dimensional finite-length domain with the Robin-type boundary conditions. The distributions of point defects for different migration lengths of defects have been calculated. The exact analytical solution was used to verify the approximate numerical solutio...
متن کامل